High Efficiency Collector for Laser Plasma EUV Source
نویسنده
چکیده
منابع مشابه
Analysis, simulation, and experimental studies of YAG and CO2 laser- produced plasma for EUV lithography sources
Efficient laser systems are essential for the realization of high volume manufacturing in extreme ultraviolet lithography (EUVL). Solid-state Nd:YAG lasers usually have lower efficiency and source suppliers are alternatively investigating the use of high power CO2 laser systems. However, CO2 laser-produced plasmas (LPP) have specific characteristics and features that should be taken into accoun...
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Laser produced plasma (LPP) systems have been developed as the primary approach for the EUV scanner light source for optical imaging of circuit features at sub-22nm and beyond nodes on the ITRS roadmap. This paper provides a review of development progress and productization status for LPP extreme-ultra-violet (EUV) sources with performance goals targeted to meet specific requirements from leadi...
متن کاملEnergetic and Thermal Sn Interactions and their Effect on EUVL Source Collector Mirror Lifetime at High Temperatures
Exposure of collector mirrors facing the hot, dense pinch plasma in plasma-based EUV light sources remains one of the highest critical issues of source component lifetime and commercial feasibility of EUV lithography technology. Studies at Argonne have focused on understanding the underlying mechanisms that hinder collector mirror performance under Sn exposure and developing methods to mitigate...
متن کاملDynamics of laser-produced Sn-based plasmas for a monochromatic 13.5 nm extreme ultraviolet source
Dynamics of laser-produced Sn-based plasmas were investigated for a monochromatic EUV lithography (EUVL) source. A hollow plasma density in a Sn plasma driven by Nd:YAG laser was observed in the late time within the laser pulse. The possible reason comes from the distributed laser energy deposition in the expanding corona. This distributed absorption results in a temperature gradient in the cor...
متن کاملEffects of Plasma Spatial Profile on Conversion Efficiency of Laser Produced Plasma Sources for EUV Lithography
Extreme ultraviolet (EUV) lithography devices that use laser produced plasma (LPP), discharge produced plasma (DPP), and hybrid devices need to be optimized to achieve sufficient brightness with minimum debris generation to support the throughput requirements of High-Volume Manufacturing (HVM) lithography exposure tools with long lifetime. Source performance, debris mitigation, and reflector sy...
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